CVD System
-- Semiconductor International, 12/1/2007
Trias is a 300 mm, high-k CVD system designed to produce the thin-film materials required for advanced gate stacks. The single-wafer cluster tool has a deposition chamber that is used to deposit hafnium-based high-k dielectrics. It also has an ultraviolet RF system capable of forming monolayer-scale insulators that serve as the interface between the high-k dielectric and silicon substrate. Tokyo Electron Ltd. (TEL), Tokyo, www.us.tel.com
