Date: Feb. 24-29, 2008

Location: San Jose Convention Center (Calif.)

The SPIE Advanced Lithography Symposium is an annual international forum bringing practitioners of micro- and nanolithography together in a stimulating, informative and interactive environment.

Work will be presented in these technical areas:

• Emerging Lithographic Technologies
• Metrology, Inspection, and Process Control
• Resist Materials and Processing Technology
• Optical Microlithography
• Design for Manufacturability through Design-Process Integration

Abstracts are due Aug. 13, 2007

spie.org/advanced-lithography.xml?WT.mc_id=RAL08QBE