Date: March 31-April 2, 2008

Location: Austin, Texas

Sematech's annual SPCC — which brings together dozens of researchers from the semiconductor industry and the university community — will focus on current developments and ITRS challenges in advanced wafer and mask cleaning and surface preparation technologies for the 32 nm node and beyond. The conference will focus on the needs and challenges in wafer and mask cleaning, including wafer front-end, wafer back-end, advanced mask, and environment, safety and health issues. Attendees can expect to gain a better understanding of the development of current and future technologies and solutions for advanced wafer and mask cleaning and surface preparation.

www.sematech.org/meetings/announcements/8170