Bevel Cleaning System
-- Semiconductor International, 1/1/2008
The Coronus is a plasma-based bevel cleaning system designed to reduce yield loss caused by defects that originate near the wafer's edge. The system combines the multiple material cleaning capability of plasma with a confinement technology that protects the die area. It is built with dynamic alignment, which provides a repeatable target cleaning area for 200 and 300 mm configurations. The targeted cleaning area can be precisely defined on the top and bottom edges of the wafer independently. Lam Research Corp., Fremont, Calif., www.lamresearch.com
