ASML, Zeiss cross-license lithography patents with Canon

The agreement between the semiconductor manufacturing equipment suppliers is expected to allow the companies to compete more freely in the area relevant to their customers, namely technology expertise and implementation, rather than on intellectual property rights.

By Ann Steffora Mutschler, Senior Editor -- Electronic News, 12/21/2007

Veldhoven, Netherlands-based lithography giant ASML Holding NV and Oberkochen, Germany-based lithography optics provider Carl Zeiss SMT said today that each company has signed a global cross-licensing agreement with Canon Inc. for patents in their respective fields of semiconductor lithography and optical components.

ASML and Zeiss said they welcome the agreement with Canon, given its substantial patent portfolio. Also, technology transfer will not occur, the companies pointed out, therefore ASML and Zeiss will continue to compete with all players in the market.

However, this agreement is expected to allow the three companies to compete more freely in the area relevant to their customers -- technology expertise and implementation – rather than on intellectual property (IP) rights. ASML and Zeiss said they are strongly committed to investing in R&D and will continue their build-up of know how and IP.

Finally, the companies said the agreement allows for each company to market products based on technology covered by the other party’s lithography equipment-related patents.