ArF Excimer Laser
Staff -- Semiconductor International, 1/1/2008 9:07:00 AM
The GT62A was designed for double patterning immersion lithography tools. It has an emission wavelength of 193 nm, an output of 90 W and a repetition rate of 6000 Hz. The laser has a light source that is mounted with a technology to take measures against the heat load. It also has highly durable optics to ensure extremely reliable performance during high-output operation. Gigaphoton Inc., Oyama, Japan, www.gigaphoton.com
