Photoresist Dry Strip System
-- Semiconductor International, 4/1/2008
Integra RS is photoresist dry strip cleaning system that can process 360 300 mm wph. Its four-chamber design — including two plasma source chambers and two process chambers that can be independently operated — gives users the choice of running different cleaning recipes simultaneously, or doing maintenance on one process chamber while the other continues to operate. The system also features improved plasma sources optimized for use with non-oxidizing chemistries. Axcelis Technologies Inc., Beverly, Mass., www.axcelis.com
