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Explore the 3rd Dimension

With 3D Packaging Equipment Solutions from SUSS MicroTec

The SUSS Solution for performing photolithography over structures with high topography combines the SUSS AltaSpray coating technology with a SUSS Mask Aligner that uses Large Exposure Gap LGO Optics.

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  • Conformal deposition of resist (large image) as well as the excellent overall coating quality for non planar profiles in glass (MOEMS) Shipley 1818. Spray coated with SUSS AltaSpray.

  • Conformal coating of 90° Sidewall AZ4999. Spray coated with SUSS AltaSpray.

  • Conformal coating of 13µm line in 200µm deep etched trench, AZ 9260 resist. Spray coated with SUSS AltaSpray, exposed with SUSS MA6 Mask Aligner equipped with LGO Optics

  • Conformal coating of 20µm line in 200µm deep etched trench, AZ 9260 resist. Spray coated with SUSS AltaSpray, exposed with SUSS MA6 Mask Aligner equipped with LGO Optics

  • Conformal coating of 50µm and 150µm l/s across 200µm deep etched trench, 10µm AZ 9260 resist Spray coated with SUSS AltaSpray, exposed with SUSS MA6 Mask Aligner equipped with LGO Optics

  • Conformal coating of 75µm line in 300µm deep KOH etched trench, 6µm AZ 9260 resist, Spray coated with SUSS AltaSpray, exposed with SUSS MA6 Mask Aligner equipped with LGO Optics