Coat/Develop System
-- Semiconductor International, 2/1/2008
RF3T is a 200 wph coat/develop track system targeted for the full range of lithography applications. The system features additional parallel process modules and higher efficiency wafer transport. The develop cell has been reconfigured for eight develop modules in the same platform footprint, providing 60% higher develop and rinse process capability than previous systems. The coating dispense system reduces chemical consumption. Sokudo Co. Ltd., Kyoto, Japan, www.sokudo.com
