Webcast: Litho Forum Survey: EUV by 2016?

Originally broadcast June 3, 2008

Register Now

Particularly with the push from flash memory manufacturers, the lithography industry is under pressure to develop the technologies needed to continue with transistor scaling — whether that's EUV lithography, double patterning, nanoimprint, high-index immersion, maskless, or all of the above. But what techniques will really be favored? Find out what the leading chipmakers and industry experts have to say about insertion schedules and readiness assessments of future lithography technologies in this presentation of the full results from surveys conducted before and after this year’s Sematech Litho Forum.

Register Now

Moderator:

Aaron Hand Executive Editor, Electronic Media Semiconductor International

Speaker:

Bernie Roman Litho Forum Program Chair Sematech

Webcast Registration Policy
The participation of our sponsors in this webcast enables us to provide this event free of charge to our registrants. Part of the value we are able to provide our sponsors is information they can use to more effectively market their products and services. Accordingly, by registering for this webcast you are agreeing that we may share your registration information with our sponsors. We do not permit these companies to use your personally identifiable information without your permission for any purpose other than to send you information about their own products and services.