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Wafer Edge Cleaning System

-- Semiconductor International, 6/1/2008

Applied Materials, Inflexion defect removal systemInflexion is a high-precision defect removal system that polishes and cleans the critical wafer edge region. The system polishes the entire wafer edge, removing all film stack residues and shallow surface defects in a single pass while minimizing the exclusion area to maximize the number of good die. It precisely controls the edge profile, which enables users to tailor the film-to-wafer interface to a specified requirement. Inflexion uses the company's Desica single-wafer wet cleaner to ensure defect removal. Abrasive tape with proprietary head technology efficiently removes all materials. Applied Materials Inc., Santa Clara, Calif., www.appliedmaterials.com

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