Plasma Cleaning, Contamination Removal System
-- Semiconductor International, 6/1/2008
PE-100 is a plasma cleaning and contamination removal system that accommodates up to 240 in. of process area capacity per run cycle. A RF power supply with matching network, vacuum pumping and a PLC-based process/vacuum controller with touchscreen programming make up the system. It operates by using a dry RF-induced ionized plasma process, which enables uniform removal of undesirable contaminants. Plasma Etch Inc., Carson City, Nev., www.plasmaetch.com
