Photoresist Strip System
-- Semiconductor International, 6/1/2008
Alpine was designed to meet the requirements of advanced low-temperature photoresist strip processes on BEOL and FEOL applications for 65 nm and below. It features an inductively coupled plasma source and bias capability that enables independent control of ion energy and ion density at low pressures to minimize damage to low-k materials. Alpine also provides users with improved profile control, low-k material preservation and a wider process window. Mattson Technology Inc., Fremont, Calif., www.mattson.com
