Dual-Mode Dry Etch Tool

PlasmalabµEtchEL is a flexible dry etch tool that offers switchable dual-mode PE/RIE capability on the company's PlasmalabµEtch200 and PlasmalabµEtch300 systems. The dual-mode configuration enables processes to be run for isotropic polyimide removal, isotropic SiNx removal and anisotropic IMD/ILD etch in a single tool for small die or packaged devices through to 200 mm wafers. It effectively removes polyimide, nitrides and oxides to reveal the underlying device structure for desired analysis. Oxford Instruments Plasma Technology Ltd., Bristol, UK, www.oxford-instruments.com